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Development of an MeV ion beam lithography system in Jyväskylä

✍ Scribed by Sergey Gorelick; Tommi Ylimäki; Timo Sajavaara; Mikko Laitinen; A. Sagari A.R.; Harry J. Whitlow


Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
429 KB
Volume
260
Category
Article
ISSN
0168-583X

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