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Detection of C2 radicals in low-pressure inductively coupled plasma source for diamond chemical vapor deposition

✍ Scribed by Shiomi, T.; Nagai, H.; Kato, K.; Hiramatsu, M.; Nawata, M.

Book ID: 123201388
Publisher: Elsevier Science
Year: 2001
Tongue: English
Weight: 257 KB
Volume: 10
Category: Article
ISSN: 0925-9635
DOI: 10.1016/S0925-9635(00)00420-9

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