Electrical properties of ultra-thin oxynitrided layer using N2O plasma in inductively coupled plasma chemical vapor deposition for non-volatile memory on glass

✍ Scribed by Sungwook Jung; Sunghyun Hwang; Kyunghae Kim; S.K. Dhungel; Ho-Kyoon Chung; Byoung-Deog Choi; Ki-Yong Lee; J. Yi

• Book ID: 108289544
• Publisher: Elsevier Science
• Year: 2007
• Tongue: English
• Weight: 636 KB
• Volume: 515
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/j.tsf.2006.11.146