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E and H regimes of plasma enhanced chemical vapor deposition of diamond-like carbon film in low frequency inductively coupled plasma reactor

✍ Scribed by Sun, Z; Xu, S; Ostrikov, K.N

Book ID: 121276891
Publisher: Elsevier Science
Year: 2002
Tongue: English
Weight: 399 KB
Volume: 11
Category: Article
ISSN: 0925-9635
DOI: 10.1016/S0925-9635(01)00524-6

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