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Deposition and characterization of non-conducting silicon nitride, aluminum nitride and titanium-aluminum nitride thin films

✍ Scribed by I.J.R. Baumvol; F.C. Stedile; W.H. Schreiner; F.L. Freire Jr.; A. Schröer

Publisher: Elsevier Science
Year: 1993
Tongue: English
Weight: 596 KB
Volume: 59
Category: Article
ISSN: 0257-8972
DOI: 10.1016/0257-8972(93)90081-x

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