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Deposition and characterization of diamond, silicon carbide and gallium nitride thin films

โœ Scribed by Robert F. Davis


Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
803 KB
Volume
137
Category
Article
ISSN
0022-0248

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Filament-activated chemical vapour depos
โœ Sadanand V. Deshpande; Jeffrey L. Dupuie; Erdogan Gulari ๐Ÿ“‚ Article ๐Ÿ“… 1996 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 987 KB

We have applied the novel method of hot filament-activated chemical vapour deposition (HFCVD) for low-temperature deposition of a variety of nitride thin films. In this paper the results from our recent work on aluminium, silicon and titanium nitride have been reviewed. In the HFCVD method a hot tun