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Characterization of titanium-aluminum nitride thin films by ion beam techniques and X-ray diffraction

✍ Scribed by FC Stedile; FL Freire Jr; WH Schreiner; IJR Baumvol


Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
708 KB
Volume
45
Category
Article
ISSN
0042-207X

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XPS and x-ray diffraction characterizati
✍ Asami, K.; Ohnuma, S.; Masumoto, T. πŸ“‚ Article πŸ“… 1998 πŸ› John Wiley and Sons 🌐 English βš– 368 KB πŸ‘ 2 views

## Thin (x = 0-30 at.% ) alloy Ðlms prepared by a reactive radio frequency (r.f.) sputtering (Co 0.8 Al 0.2 ) 100-x N x method were characterized by XPS and x-ray di †raction (XRD). The Ðlm with no nitrogen consisted of a CsCltype CoAl metallic compound, while the nitrogen-containing alloys were c