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Deposition of aluminum nitride thin films by MOCVD from the trimethylaluminum–ammonia adduct

✍ Scribed by Prof. Anthony C. Jones; Simon A. Rushworth; Dr. David J. Houlton; Dr. John S. Roberts; Dr. Victoria Roberts; Prof. Colin R. Whitehouse; Gary W. Critchlow

Publisher
John Wiley and Sons
Year
1996
Tongue
English
Weight
480 KB
Volume
2
Category
Article
ISSN
0948-1907

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