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The deposition of aluminum thin films by CVD using a novel adduct of dimethylaluminum hydride

✍ Scribed by Dr. Anthony C. Jones; Dr. David J. Houlton; Simon A. Rushwarth; Julia A. Flanagan; Juliette R. Brown; Gary W. Critchlow

Publisher
John Wiley and Sons
Year
1995
Tongue
English
Weight
467 KB
Volume
1
Category
Article
ISSN
0948-1907

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