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Dependence of Sheet Resistance on SiO[sub 2] Masking Geometry in Diffused Si Regions

✍ Scribed by Décosterd, J. P.; Chauvy, D.; Hübner, K.

Book ID: 126697152
Publisher: The Electrochemical Society
Year: 1968
Tongue: English
Weight: 286 KB
Volume: 115
Category: Article
ISSN: 0013-4651
DOI: 10.1149/1.2411425

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