✦ LIBER ✦
Diffusion and activation of ultrashallow B implants in silicon on insulator: End-of-range defect dissolution and the buried SiâSiO[sub 2] interface
✍ Scribed by Hamilton, J. J.; Cowern, N. E. B.; Sharp, J. A.; Kirkby, K. J.; Collart, E. J. H.; Colombeau, B.; Bersani, M.; Giubertoni, D.; Parisini, A.
- Book ID
- 120159332
- Publisher
- American Institute of Physics
- Year
- 2006
- Tongue
- English
- Weight
- 384 KB
- Volume
- 89
- Category
- Article
- ISSN
- 0003-6951
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