Defects introduced in n-type silicon wafers" by irradiation with 1.6 GeV Ar "~+ ions have been analysed using deep level transient spectroscopy. The defect spatial distribution has been measured along the whole path of the argon ions in a silicon crystal. 7he energy levels" and capture cross'section
โฆ LIBER โฆ
Defects created by 3.5 GeV xenon ions in silicon
โ Scribed by P. Mary; P. Bogdanski; G. Nouet; M. Toulemonde
- Publisher
- Elsevier Science
- Year
- 1989
- Tongue
- English
- Weight
- 211 KB
- Volume
- 43
- Category
- Article
- ISSN
- 0169-4332
No coin nor oath required. For personal study only.
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