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Annealing behavior of metastable defects created by bias stress in hydrogenated amorphous silicon thin film transistors

โœ Scribed by Jeong Young Lee; Choonchon Lee; Jin Jang; Byung Seong Bae


Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
250 KB
Volume
83
Category
Article
ISSN
0038-1098

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