Annealing behavior of thin polycrystalline silicon films damaged by silicon ion implantation in the critical amorphization range

✍ Scribed by P. Kwizera; R. Reif

• Publisher: Elsevier Science
• Year: 1983
• Tongue: English
• Weight: 617 KB
• Volume: 100
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/0040-6090(83)90280-8