Thin SiO2 films formed by oxygen ion implantation in silicon: Electron microscope investigations of the Si-SiO2 interface structures and their c-v characteristics

✍ Scribed by J. Dylewski; M.C. Joshi

• Publisher: Elsevier Science
• Year: 1976
• Tongue: English
• Weight: 967 KB
• Volume: 37
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/0040-6090(76)90190-5