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Defect reduction in (1 1 2̄ 0) nonpolar a-plane GaN grown on r-plane sapphire using TiN interlayers

✍ Scribed by S.R. Xu; J.C. Zhang; L.A. Yang; X.W. Zhou; Y.R. Cao; J.F. Zhang; J.S. Xue; Z.Y. Liu; J.C. Ma; F. Bao; Y. Hao


Book ID
108166369
Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
575 KB
Volume
327
Category
Article
ISSN
0022-0248

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Growth of nonpolar m-plane GaN (1 0
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A newly designed two-step reactor which places both chemical vapor deposition (CVD) and hydride vapor phase epitaxy (HVPE) in series is proposed to grow nonpolar m-plane GaN (1 0 À 1 0) material on a closely lattice-matched (1 0 0) LiAlO 2 single crystal substrate. The surface morphologies are chara