An earlier study of the magnetron sputtering of copper in this laboratory has shown that the growth rate in Ar for a dc magnetron is almost twice that for an rf system with an identical target, operated at the same indicated power input. Experiments have been made to find whether the difference in t
โฆ LIBER โฆ
Decay length of the pressure dependent deposition rate for magnetron sputtering
โ Scribed by Drusedau, Tilo P.; Lohmann, Mirko; Garke, Bernd
- Book ID
- 118229181
- Publisher
- AVS (American Vacuum Society)
- Year
- 1998
- Tongue
- English
- Weight
- 358 KB
- Volume
- 16
- Category
- Article
- ISSN
- 0734-2101
- DOI
- 10.1116/1.581408
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