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Damage distribution and annealing behaviour of high-energy 115In+ implanted into Si(100)

✍ Scribed by Zhang Bo-Xu; Wang Zhong-Lie; R.J. Schreutelkamp; F.W. Saris; Du An-Yan; Li Qi


Book ID
113280603
Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
646 KB
Volume
48
Category
Article
ISSN
0168-583X

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