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Influence of channeling effects on ion distribution and damage profiles during high energy ion implantation in Si

โœ Scribed by Carnera, A. ;Gasparotto, A. ;Berti, M. ;Fabbri, R.


Publisher
Springer-Verlag
Year
1994
Weight
370 KB
Volume
114-115
Category
Article
ISSN
0344-838X

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