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The effect of ion implantation energy and dosage on the microstructure of the ion beam synthesized FeSi2 in Si

✍ Scribed by Y.T. Chong; Q. Li; C.F. Chow; N. Ke; W.Y. Cheung; S.P. Wong; K.P. Homewood

Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
252 KB
Volume
124-125
Category
Article
ISSN
0921-5107

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