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CVD of Zr0.65Ti0.35O2 Thin Films Using a Single-Source Precursor of Novel Anhydrous Mixed-Metal Nitrates

✍ Scribed by Q. Shao; A. Li; W. Zhang; D. Wu; Z. Liu; N. Ming


Publisher
John Wiley and Sons
Year
2006
Tongue
English
Weight
882 KB
Volume
12
Category
Article
ISSN
0948-1907

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Deposition of Thin Films of Gallium Sulfide from a Novel Liquid Single-Source Precursor, Ga(SOCNEt 2 ) 3 , by Aerosol-Assisted CVD. -The novel liquid gallium monothiocarbamato complex (III) is utilized as a single-source precursor for the deposition of face-centered cubic GaS films on glass substra