Low-temperature chemical vapor deposition of indium sulfide thin films using a novel single-source indium thiocarboxylate compound as precursor

✍ Scribed by Dr. Guihua Shang; Dr. Klaus Kunze; Prof. Mark J. Hampden-Smith; Dr. Eileen N. Duesler

• Publisher: John Wiley and Sons
• Year: 1996
• Tongue: English
• Weight: 483 KB
• Volume: 2
• Category: Article
• ISSN: 0948-1907
• DOI: 10.1002/cvde.19960020606