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Computer simulated and channelling studies of damage distributions in phosphorus implanted silicon

✍ Scribed by H Budinov; DS Karpuzov

Publisher: Elsevier Science
Year: 1988
Tongue: English
Weight: 251 KB
Volume: 38
Category: Article
ISSN: 0042-207X
DOI: 10.1016/0042-207x(88)90561-1

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