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Experimental study and computer simulation of aspect ratio dependent effects observed in silicon reactive ion etching

✍ Scribed by V.A. Yunkin; V.F. Lukichev; K.V. Rudenko; D. Fischer; E. Voges


Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
967 KB
Volume
30
Category
Article
ISSN
0167-9317

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