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Ion implantation. II. Investigation of distribution of effective ranges of phosphorus ions implanted into single crystal silicon: A Golanski and R Dybczynski, Nukleonika, 18 (8), 1973, 351–360 (in Polish)


Publisher
Elsevier Science
Year
1975
Tongue
English
Weight
162 KB
Volume
25
Category
Article
ISSN
0042-207X

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