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Composition and growth kinetics of ultrathin SiO2 films formed by oxidizing Si substrates in N2O

โœ Scribed by Ting, W.; Hwang, H.; Lee, J.; Kwong, D. L.


Book ID
121849173
Publisher
American Institute of Physics
Year
1990
Tongue
English
Weight
540 KB
Volume
57
Category
Article
ISSN
0003-6951

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