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Compensating corner undercutting in anisotropic etching of (100) silicon

โœ Scribed by Xian-Ping Wu; Wen H. Ko


Publisher
Elsevier Science
Year
1989
Weight
865 KB
Volume
18
Category
Article
ISSN
0250-6874

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We have investigated the generation of inverted pyramids in the sub-100 nm region. A process based on e-beam lithography and anisotropic etching in aqueous KOH was developed which allows the generation of sub-100 nm pyramidal etch pits in a reproducible manner. Inverted pyramids as small as 75 nm wi