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Comparison of hafnium oxide films grown by atomic layer deposition from iodide and chloride precursors

✍ Scribed by Kaupo Kukli; Mikko Ritala; Timo Sajavaara; Juhani Keinonen; Markku Leskelä


Book ID
108388471
Publisher
Elsevier Science
Year
2002
Tongue
English
Weight
461 KB
Volume
416
Category
Article
ISSN
0040-6090

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