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The influence of growth temperature and precursors’ doses on electrical parameters of ZnO thin films grown by atomic layer deposition technique

✍ Scribed by T. Krajewski; E. Guziewicz; M. Godlewski; L. Wachnicki; I.A. Kowalik; A. Wojcik-Glodowska; M. Lukasiewicz; K. Kopalko; V. Osinniy; M. Guziewicz

Publisher: Elsevier Science
Year: 2009
Tongue: English
Weight: 382 KB
Volume: 40
Category: Article
ISSN: 0026-2692
DOI: 10.1016/j.mejo.2008.07.053

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