✦ LIBER ✦

Chemical vapor deposition precursor chemistry 1: The deposition of pure aluminum thin films from an aluminaborane precursor compound by chemical vapor deposition

✍ Scribed by John A. Glass Jr.; Shreyas Kher; James T. Spencer

Publisher: Elsevier Science
Year: 1992
Tongue: English
Weight: 500 KB
Volume: 207
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(92)90093-q

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Chemical vapor deposition precursor chem

Chemical vapor deposition precursor chemistry. 5. The photolytic laser deposition of aluminum thin films by chemical vapor deposition

✍ John A. Glass Jr; Seong-Don Hwang; Saswatti Datta; Brian Robertson; James T. Spe 📂 Article 📅 1996 🏛 Elsevier Science 🌐 English ⚖ 814 KB

Chemical Vapor Deposition of TixSi1–xO2

Chemical Vapor Deposition of TixSi1–xO2 Films: Precursor Chemistry Impacts Films Composition

✍ R.C. Smith; N. Hoilien; C. Dykstra; S.A. Campbell; J.T. Roberts; W.L. Gladfelter 📂 Article 📅 2003 🏛 John Wiley and Sons 🌐 English ⚖ 443 KB 👁 1 views

Deposition of Bismuth Chalcogenide Thin

Deposition of Bismuth Chalcogenide Thin Films Using Novel Single-Source Precursors by Metal-Organic Chemical Vapor Deposition.

✍ John Waters; David Crouch; James Raftery; Paul O'Brien 📂 Article 📅 2004 🏛 John Wiley and Sons ⚖ 11 KB 👁 2 views

ChemInform Abstract: Deposition of Cadmi

ChemInform Abstract: Deposition of Cadmium Sulfide Thin Films from the Single-Source Precursor Bis(diethylmonothiocarbamato)cadmium(II) by Low-Pressure Metallorganic Chemical Vapor Deposition.

✍ M. CHUNGGAZE; M. A. MALIK; P. O'BRIEN 📂 Article 📅 2010 🏛 John Wiley and Sons ⚖ 32 KB 👁 2 views

Low-temperature chemical vapor depositio

Low-temperature chemical vapor deposition of indium sulfide thin films using a novel single-source indium thiocarboxylate compound as precursor

✍ Dr. Guihua Shang; Dr. Klaus Kunze; Prof. Mark J. Hampden-Smith; Dr. Eileen N. Du 📂 Article 📅 1996 🏛 John Wiley and Sons 🌐 English ⚖ 483 KB 👁 1 views

Growth of cubic (100) SrTiO3 thin films

Growth of cubic (100) SrTiO3 thin films by plasma-enhanced chemical vapor deposition using a novel titanium precursor

✍ Dr. Helga Holzschuh; Prof. Harald Suhr 📂 Article 📅 1992 🏛 John Wiley and Sons 🌐 English ⚖ 352 KB 👁 1 views