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Chemical vapor deposition precursor chemistry. 5. The photolytic laser deposition of aluminum thin films by chemical vapor deposition

✍ Scribed by John A. Glass Jr; Seong-Don Hwang; Saswatti Datta; Brian Robertson; James T. Spencer

Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
814 KB
Volume
57
Category
Article
ISSN
0022-3697

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## Abstract Atmospheric pressure chemical vapor deposition (APCVD) of niobium sulfide coatings was achieved on glass substrates from the reaction of NbCl~5~ and S(SiMe~3~)~2~, __t__Bu~2~S~2~, __t__BuSH, or HSCH~2~CH~2~SH at 250βˆ’600 Β°C. The niobium sulfide films grown at temperatures above 500 Β°C we