✦ LIBER ✦

Chemical vapor deposition of fine-grained equiaxed tungsten films

✍ Scribed by David W. Woodruff; Joan M. Redwing

Publisher: Elsevier Science
Year: 1991
Tongue: English
Weight: 651 KB
Volume: 49
Category: Article
ISSN: 0257-8972
DOI: 10.1016/0257-8972(91)90058-5

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Chemical vapor deposition of tungsten ox

Chemical vapor deposition of tungsten oxide

✍ Rein U. Kirss; Lamartine Meda 📂 Article 📅 1998 🏛 John Wiley and Sons 🌐 English ⚖ 117 KB 👁 1 views

Crystalline and amorphous thin films of tungsten(VI) oxide can be prepared by chemical vapor deposition using a variety of volatile precursors below 500 °C. Deposition parameters for preparation of WO 3 films from tungsten hexacarbonyl [W(CO) 6 ], tungsten hexafluoride (WF 6 ), tungsten ethoxides [W

Characterization of low pressure chemica

Characterization of low pressure chemically vapor-deposited tungsten nitride films

✍ Steven D. Marcus; R.F. Foster 📂 Article 📅 1993 🏛 Elsevier Science 🌐 English ⚖ 368 KB

Plasma-enhanced chemical vapor depositio

Plasma-enhanced chemical vapor deposition of tungsten

✍ M.A. Mahowald; N.J. Ianno 📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 333 KB

Properties of chemically vapor-deposited

Properties of chemically vapor-deposited Tungsten thin films on silicon wafers

✍ Michael Diem; Michael Fisk; Jon Goldman 📂 Article 📅 1983 🏛 Elsevier Science 🌐 English ⚖ 227 KB

Kinetics of chemical vapor deposition of

Kinetics of chemical vapor deposition of tungsten carbide

✍ C.Michael Kelly; Diwakar Garg; Paul N. Dyer 📂 Article 📅 1992 🏛 Elsevier Science 🌐 English ⚖ 490 KB

ChemInform Abstract: Deposition of Elect

ChemInform Abstract: Deposition of Electrochromic Tungsten Oxide Thin Films by Plasma- Enhanced Chemical Vapor Deposition.

✍ W. B. HENLEY; G. J. SACKS 📂 Article 📅 2010 🏛 John Wiley and Sons ⚖ 27 KB 👁 2 views