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Plasma-enhanced chemical vapor deposition of tungsten

โœ Scribed by M.A. Mahowald; N.J. Ianno


Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
333 KB
Volume
170
Category
Article
ISSN
0040-6090

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Crystalline and amorphous thin films of tungsten(VI) oxide can be prepared by chemical vapor deposition using a variety of volatile precursors below 500 ยฐC. Deposition parameters for preparation of WO 3 films from tungsten hexacarbonyl [W(CO) 6 ], tungsten hexafluoride (WF 6 ), tungsten ethoxides [W