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Properties of chemically vapor-deposited Tungsten thin films on silicon wafers

✍ Scribed by Michael Diem; Michael Fisk; Jon Goldman

Publisher: Elsevier Science
Year: 1983
Tongue: English
Weight: 227 KB
Volume: 107
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(83)90005-6

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