High-Throughput Chemical Vapor Deposition System and Thin-Film Silicon Library

✍ Scribed by Qi Wang; Fengzhen Liu; Daxing Han

• Publisher: John Wiley and Sons
• Year: 2004
• Tongue: English
• Weight: 133 KB
• Volume: 25
• Category: Article
• ISSN: 1022-1336
• DOI: 10.1002/marc.200300151

✦ Synopsis

Abstract

Summary: Thin‐film Si materials library were fabricated rapidly on glass substrates using the combinatorial hot‐wire CVD technique. We found that the films with high hydrogen dilution become microcrystalline Si, and the films with no and low hydrogen dilution remain in the amorphous Si structure. We also found that the ratio of hydrogen to silane (R) is a good measure of the structure change.

Schematics of a combinatorial HWCVD system.

magnified imageSchematics of a combinatorial HWCVD system.