Chemical Vapor Deposition of Diamond Films in Hot Filament Reactor
โ Scribed by M. Grus; A. Jankowska-Frydel; J. Bohdanowicz; K. Zawada
- Publisher
- John Wiley and Sons
- Year
- 2001
- Tongue
- English
- Weight
- 416 KB
- Volume
- 36
- Category
- Article
- ISSN
- 0232-1300
No coin nor oath required. For personal study only.
๐ SIMILAR VOLUMES
The diamond Raman lines were examined around the He' ion implantation-induced channels in chemical vapor deposited รlms over Si substrates. Several spectra from di โ erent positions around the channels, formed at di โ erent target currents, were obtained using a Raman microprobe. It is concluded that
The reaction kinetics for the formation of CuInSe 2 ยฎlms by reacting Cu/In layers with elemental selenium are compared with those for H 2 Se. The species mole fractions as a function of time in a single Se-source physical vapor deposition (PVD) reactor are found to be essentially the same as those o