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Chemical Vapor Deposition of Copper Films from Copper Dipivaloylmethanate in Hydrogen Atmosphere

✍ Scribed by V. V. Bakovets; T. M. Levashova; I. P. Dolgovesova; V. S. Danilovich

Book ID: 110337083
Publisher: SP MAIK Nauka/Interperiodica
Year: 2002
Tongue: English
Weight: 307 KB
Volume: 38
Category: Article
ISSN: 0020-1685
DOI: 10.1023/a:1015462820076

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