𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Chemical Vapor Deposition of Copper from Copper (II) Hexafluoroacetylacetonate

✍ Scribed by Temple, D.


Book ID
121362084
Publisher
The Electrochemical Society
Year
1989
Tongue
English
Weight
545 KB
Volume
136
Category
Article
ISSN
0013-4651

No coin nor oath required. For personal study only.


πŸ“œ SIMILAR VOLUMES


Incubation time for chemical vapor depos
✍ Lu-Sheng Hong; Muh-Gueng Jeng πŸ“‚ Article πŸ“… 2000 πŸ› Elsevier Science 🌐 English βš– 286 KB

The incubation time in a metal-organic chemical vapor deposition MOCVD system using copper I -hexafluoroace-Ε½ Ε½ .Ε½ .. tylacetonate vinyltrimethoxysilane Cu hfac VTMOS as the precursor to grow copper films has been investigated. For film deposition on a TiNrSi substrate in the presence of H at 473 K,

Mechanisms of copper chemical vapor depo
✍ Cohen, Susan L.; Liehr, Michael; Kasi, Srinandan πŸ“‚ Article πŸ“… 1992 πŸ› American Institute of Physics 🌐 English βš– 685 KB