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Selectivity in low pressure chemical vapor deposition of copper from hexafluoroacetylacetonate-copper(I)-trimethylvinylsilane in the presence of water

โœ Scribed by Thomas H. Stumm; Hubert van den Bergh


Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
601 KB
Volume
23
Category
Article
ISSN
0921-5107

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