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Selective low-temperature chemical vapor deposition of copper from (hexafluoroacetylacetonato)copper(I)trimethylphosphine, (hfa)CuP(Me)3

✍ Scribed by Prof. Toivo T. Kodas; H.-K. Shin; Dr. K.-M. Chi; Prof. Mark J. Hampden-Smith; John D. Farr; Dr. Mark Paffett


Publisher
John Wiley and Sons
Year
1991
Tongue
English
Weight
259 KB
Volume
3
Category
Article
ISSN
0935-9648

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