๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Microstructures of copper thin films prepared by chemical vapor deposition

โœ Scribed by Nam-Ihn Cho; Dong Il Park


Book ID
114086212
Publisher
Elsevier Science
Year
1997
Tongue
English
Weight
311 KB
Volume
308-309
Category
Article
ISSN
0040-6090

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Copper thin films prepared by chemical v
โœ T. Maruyama; Y. Ikuta ๐Ÿ“‚ Article ๐Ÿ“… 1993 ๐Ÿ› Springer ๐ŸŒ English โš– 512 KB

Copper thin films were prepared by a low-temperature atmospheric-pressure chemical vapour deposition method. The raw material was copper dipivalylmethanate which is volatile and thermally stable. At a reaction temperature above 220 ~ polycrystalline copper films can be obtained by hydrogen reduction

Copper thin films prepared by chemical v
โœ T. Maruyama; T. Shirai ๐Ÿ“‚ Article ๐Ÿ“… 1995 ๐Ÿ› Springer ๐ŸŒ English โš– 493 KB

Copper thin films were prepared by a low-temperature atmospheric pressure chemical vapour deposition method. The raw material was copper (11) acetylacetonate. At a reaction temperature above 220 ~ polycrystalline copper films can be obtained by hydrogen reduction of the raw material. The resistivity