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Copper thin films prepared by chemical vapour deposition from copper (II) acetylacetonate

✍ Scribed by T. Maruyama; T. Shirai

Publisher
Springer
Year
1995
Tongue
English
Weight
493 KB
Volume
30
Category
Article
ISSN
0022-2461

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✦ Synopsis

Copper thin films were prepared by a low-temperature atmospheric pressure chemical vapour deposition method. The raw material was copper (11) acetylacetonate. At a reaction temperature above 220 ~ polycrystalline copper films can be obtained by hydrogen reduction of the raw material. The resistivity of the film was close to that for bulk copper.

πŸ“œ SIMILAR VOLUMES

Copper thin films prepared by chemical v
Copper thin films prepared by chemical vapour deposition from copper dipivalylmethanate
✍ T. Maruyama; Y. Ikuta πŸ“‚ Article πŸ“… 1993 πŸ› Springer 🌐 English βš– 512 KB

Copper thin films were prepared by a low-temperature atmospheric-pressure chemical vapour deposition method. The raw material was copper dipivalylmethanate which is volatile and thermally stable. At a reaction temperature above 220 ~ polycrystalline copper films can be obtained by hydrogen reduction