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Nickel thin films prepared by chemical vapour deposition from nickel acetylacetonate

โœ Scribed by T. Maruyama; T. Tago

Book ID
104813457
Publisher
Springer
Year
1993
Tongue
English
Weight
650 KB
Volume
28
Category
Article
ISSN
0022-2461

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๐Ÿ“œ SIMILAR VOLUMES

Copper thin films prepared by chemical v
Copper thin films prepared by chemical vapour deposition from copper (II) acetylacetonate
โœ T. Maruyama; T. Shirai ๐Ÿ“‚ Article ๐Ÿ“… 1995 ๐Ÿ› Springer ๐ŸŒ English โš– 493 KB

Copper thin films were prepared by a low-temperature atmospheric pressure chemical vapour deposition method. The raw material was copper (11) acetylacetonate. At a reaction temperature above 220 ~ polycrystalline copper films can be obtained by hydrogen reduction of the raw material. The resistivity

Copper thin films prepared by chemical v
Copper thin films prepared by chemical vapour deposition from copper dipivalylmethanate
โœ T. Maruyama; Y. Ikuta ๐Ÿ“‚ Article ๐Ÿ“… 1993 ๐Ÿ› Springer ๐ŸŒ English โš– 512 KB

Copper thin films were prepared by a low-temperature atmospheric-pressure chemical vapour deposition method. The raw material was copper dipivalylmethanate which is volatile and thermally stable. At a reaction temperature above 220 ~ polycrystalline copper films can be obtained by hydrogen reduction