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Chemical resistance of thin film materials based on metal oxides grown by atomic layer deposition

✍ Scribed by Sammelselg, Väino; Netšipailo, Ivan; Aidla, Aleks; Tarre, Aivar; Aarik, Lauri; Asari, Jelena; Ritslaid, Peeter; Aarik, Jaan

Book ID: 122838478
Publisher: Elsevier Science
Year: 2013
Tongue: English
Weight: 711 KB
Volume: 542
Category: Article
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2013.06.079

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