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Properties of tantalum oxide thin films grown by atomic layer deposition

✍ Scribed by Kaupo Kukli; Jaan Aarik; Aleks Aidla; Oksana Kohan; Teet Uustare; Väino Sammelselg

Book ID
107864403
Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
963 KB
Volume
260
Category
Article
ISSN
0040-6090

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Transparent and conductive undoped zinc
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✍ Luka, Grzegorz ;Krajewski, Tomasz ;Wachnicki, Lukasz ;Witkowski, Bartlomiej ;Lus 📂 Article 📅 2010 🏛 John Wiley and Sons 🌐 English ⚖ 582 KB

## Abstract Atomic layer deposition (ALD) was used to fabricate transparent and conductive thin films of ZnO. Two hundred‐nano metre thick ZnO films were deposited on glass substrates at low growth temperatures varied between 120 and 240 °C. As zinc and oxygen precursors we used diethylzinc (DEZn)