Characterization of reduced pressure chemical vapor deposited Si0.8Ge0.2/Si multi-layers

✍ Scribed by Shim, Kyu-Hwan; Deok Yang, Hyeon; Kil, Yeon-Ho; Yang, Jong-Han; Hong, Woong-Ki; Kim, Jeong-Jin; Kang, Sukill; Soo Jeong, Tae; Sung Kim, Taek

• Book ID: 118218719
• Publisher: Elsevier Science
• Year: 2013
• Tongue: English
• Weight: 364 KB
• Volume: 16
• Category: Article
• ISSN: 1369-8001
• DOI: 10.1016/j.mssp.2012.06.002