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Characterization of particle contamination in process steps during plasma-enhanced chemical vapor deposition operation

✍ Scribed by Heru Setyawan; Manabu Shimada; Yuji Imajo; Yutaka Hayashi; Kikuo Okuyama

Book ID: 117130005
Publisher: Elsevier Science
Year: 2003
Tongue: English
Weight: 1015 KB
Volume: 34
Category: Article
ISSN: 0021-8502
DOI: 10.1016/s0021-8502(03)00066-1

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