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Quantum chemical study of the SiC formation process in plasma enhanced chemical vapor deposition system

✍ Scribed by Akitomo Tachibana; Susumu Kawauchi; Tasuku Yano; Naoto Yoshida; Tokio Yamabe

Book ID: 113258610
Publisher: Elsevier Science
Year: 1994
Tongue: English
Weight: 459 KB
Volume: 313
Category: Article
ISSN: 0166-1280
DOI: 10.1016/0166-1280(94)85035-6

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