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Effects of process parameters on the growth of thick SiO2 using plasma enhanced chemical vapor deposition with hexamethyldisilazane

✍ Scribed by Jin-Kyung Choi; D.H. Kim; J. Lee; Ji-Beom Yoo

Book ID
108422754
Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
477 KB
Volume
131
Category
Article
ISSN
0257-8972

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