The influence of temperature and pressure on the structure of remote plasma enhanced chemically vapor deposited SiO2 investigated by spectroscopic ellipsometry

✍ Scribed by B. Gruska; K. Wandel

• Publisher: Elsevier Science
• Year: 1993
• Tongue: English
• Weight: 359 KB
• Volume: 233
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/0040-6090(93)90099-b